optics filming meaning in Chinese
光学镜面涂膜
Examples
- In order to fabricate excellent electro - optic materials , this paper focused on the choice of electro - optic materials , the fabrication of ceramics target , developing new rf magnetron sputtering system , and the preparation of the electro - optic film , etc . the following results were obtained
本文围绕制备性能优异的电光材料,从电光材料的选择、材料配比、靶材制备、射频磁控溅射镀膜设备的研制、电光薄膜材料制作等方面进行了研究。 - The processing parameters of preparing plzt electro - optic films were 400 of substrate temperature , 100w of sputtering power , 1 : 6 ratio of oxygen to nitrogen and 650 of annealing . the processing parameters of preparing sno2 film were room temperature of substrate temperature , 200w of sputtering power , 1 : 2 ratio of oxygen to nitrogen and 600 of the annealing temperature
制备plzt电光薄膜的最佳工艺参数为:衬底温度400 ,溅射功率100w ,氧氩比为1 : 6 ,退火温度为650 ;而制备二氧化锡透明电极的最佳工艺参数为:衬底温度室温、溅射功率200w 、氧氩比为1 : 2 、退火温度为600 。 - Its potential and maximal application field is for semiconductor films and optic films that mainly rely on the high - orientation and single crystal diamond films and big area transparent diamond films . but it is widely existent for defects in the process of diamond films growth and also it is difficult to get parameters stability such as temperature etc in wide area , as a result , the diamond films " orientation is changed , and it is very difficult to get the high - orientation and single crystal diamond films and big area transparent diamond films
金刚石膜潜在的最大应用领域是作为半导体薄膜和光学薄膜，而这个领域的开发在很大程度上依赖于高取向和单晶金刚石薄膜以及大面积透明金刚石膜的获得，但由于金刚石膜生长过程中缺陷的普遍存在以及大面积范围内均匀温度场等参数的难以获取，从而导致金刚石膜的取向发生改变，使高取向和单晶金刚石薄膜以及大面积透明金刚石膜的获得十分困难。